1,Description:

1. Molybdenum sputtering target is a high-purity material used in physical vapor deposition (PVD) processes.
2. It is commonly used in thin film deposition applications for coating various substrates.
3. Molybdenum sputtering targets exhibit excellent thermal and electrical conductivity properties.
4. They are known for their high melting point, good adhesion, and uniform film deposition.
5. Molybdenum targets are widely used in industries such as semiconductor, display, solar cells, and optical coatings.

2,Specifications:

As a leading manufacturer of refractory metal products such as tungsten and molybdenum, our products are widely used in electronics&semiconductor, high temperature furnace industry, medical industry, glass&fiberglass industry and other fields. The main products include pure molybdenum, molybdenum alloy such as MoLa, TZM, and MoW; pure tungsten, tungsten alloy such us WCu, WNiFe, WNiCu and so on.